EB Mask Writer EBM-9500

EB Mask Writer for 7nm node Production

EB Mask Writer EBM-9500

The EB Mask Writer system "EBM-9500" with enhanced placement accuracy is suitable for developing next generation photo-masks.


  • 1) 50kV acceleration voltage enables greater contrast writing.
  • 2) Multiple pass writing method improves the performance of shot stitching.
  • 3) High throughput with variable stage speed and high current Density(1200A/cm2)

Key Parameters

Mask size 6inch
Acceleration voltage 50kV
Current density 1200A/cm2