EB Mask Writer for 7nm node Production
The EB Mask Writer system "EBM-9500" with enhanced placement accuracy is suitable for developing next generation photo-masks.
- 1) 50kV acceleration voltage enables greater contrast writing.
- 2) Multiple pass writing method improves the performance of shot stitching.
- 3) High throughput with variable stage speed and high current Density(1200A/cm2)