EGV-30GX Vertical Batch Epitaxial Reactor

NuFlare Technology's EGV series realizes high quality epi wafer production at low cost.

Features

  1. Bigger batch size than the previous model. (20% max. in 6" wafer production)
  2. Throughput improvement by 13% with overlap control resulting in high productivity and better energy-saving capability.
  3. Capable of processing ultra-thick epi and multi layer epi for power devices.

Process performance

Batch size φ4:30 wafers/batch
φ5:21 wafers/batch
φ6:12 wafers/batch
Thickness uniformity Within wafer : ±4%
Within batch : ±6%
Batch to batch : ±3%
Resistivity uniformity Within wafer : ±4%
Within batch : ±6%
Batch to batch : ±3%
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