Development Roadmap

Our main product, the EBM-9500, can write patterns with sub-nanometer (1/10,000 of one micron) precision, on photomasks for 7nm design rule devices. Circuit patterns on the mask are written four times the size of that exposed onto the wafer, but they require the same precision because of the complexity of the patterns.

Because the development for the photomasks is before production for the new devices, mask writers must be developed even before the photomasks.

NuFlare Technology will continue to develop leading edge mask writers while watching the trend of next generation lithography technology, such as EUV or nanoimprint, to meet the needs of developing devices beyond the 5nm generation.

Development Roadmap

Development Roadmap
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