Development Roadmap

Our main product, the EBM-9500, can write patterns with sub-nanometer (1/10,000 of one micron) precision, on photomasks for 7nm design rule devices. Circuit patterns on the mask are written four times the size of that exposed onto the wafer, but they require the same precision because of the complexity of the patterns.

Production for the 7nm devices will start around 2017 or 2018.Because the development for the photomasks is before this timeframe, mask writers must be developed even before the photomasks.

NuFlare Technology will continue to develop leading edge mask writers while watching the trend of next generation lithography technology, such as EUV or nanoimprint, to meet the needs of developing devices beyond the 7nm generation.

Development Roadmap

Development Roadmap
ページの上部へ