List of Awards & Papers

List of Awards Received by Nuflare Technology,Inc. Employees

Date Awarded Title of Award Title of Work Organization
June 19th, 2006 The National Commendation for Invention (2006) The Prize of the Minister of Economy Trade and Industry "Invention of Proximity Effect Correction for Electron Beam Writing System" Japan Institute of Invention and Innovation (JIII)
April 17th, 2007 The Commendation for Science and Technology by the Minister of Education, Culture, Sports, Science and Technology (2007) Prize for Science and Technology (Development Category ) "Development of Proximity Effect Correction for Electron Beam Mask Writing System" Ministry of Education, Culture, Sports, Science and Technology
February, 2013 The 59th Okochi Memorial Grand Production Prize "Development and practical application of electron beam (EB) mask writers." Okochi Memorial Foundation

Refereed Papers by Nuflare Technology,Inc. Employees

Publication Year Title of Paper Name of Journal
2007 High-Accuracy Proximity Effect Correction for Mask Writing Japanese Journal of Applied Physics,Vol.46A, p826
2007 Global Critical Dimension Correction I.
Fogging Effect Correction
Japanese Journal of Applied Physics,Vol.46A, p3359
2007 Global Critical Dimension Correction II Japanese Journal of Applied Physics,Vol.46A, p3368
2008 Accurate correction of critical dimension errors appearing in LSI fabrication processes Journal of Micro/Nano Lithography, MEMS,and MOEMS Vol.7, 023006
2008 High accuracy correction of critical dimension errors taking sequence of large-scale integrated circuits fabrication processes into account Journal of Micro/Nano Lithography, MEMS, and MOEMS Vol.7, 043008
2009 High accuracy correction of critical dimension errors appearing in large-scale integrated circuits fabrication processes:pattern-based model Japanese Journal of Applied Physics,Vol.48, 046508
2009 Proximity Effect Correction for Mask Writing Taking Resist Development Process into Account Japanese Journal of Applied Physics,Vol.48, 095004

Book etc

Date Title Type
2000 Sub-Half-Micron Lithography for ULSIs 
(Cambridge University Press)
Section 4.4 Proximity effect correction
Book
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